Optical Properties of Tantalum Oxide Thin Films Obtained by Laser Deposition Tehniques

Tantalum oxide is a compound with attractive properties and important applications in optoelectronis. It has a high refractive index and a good thermal and chemical stability. Tantalum oxide thin layers have been deposited by laser ablationpulsed laser deposition (PLD) and radiofrequency assisted pulsed laser ablation (RF-PLD) starting from a Tantalum metallic target in oxygen atmosphere. In the present paper the influence of deposition parameters (laser wavelength, substrate temperature and radiofrequency power) on the morphology and the optical properties was studied.The investigation techniques used for the characterization of the deposited layers were atomic force microscopy and spectroellipsometry.